Yarmouth is now offering a new, proprietary process for cleaning GaN epi reactors. This process was developed in Japan by Furukawa Denshi and offers efficient removal of GaN ,InGaN, AlGaN and AlN via a dry chlorine etch. Our process is fast (5-6 hours typical etch time) and makes very efficient use of chlorine (<10% Cl waste). Please contact us for details.
New Semiconductor Products!
Yarmouth Materials is now supplying 6N and 7N antimony metal for semiconductor applications – please contact us for details:
Yarmouth Materials: Supplier of the world’s finest yttrium oxides, aluminum oxides and rare earths
Supplier of the world’s finest yttrium oxides, aluminum oxides and rare earths.
Recent yttrium oxide lots: